Ultra-low Surface Roughness Polishing
- MRF generally maintains or improves surface roughness
- Minimum roughness obtained with MRF typically 3-5 Å
- Results depend on substrate material and MR fluid used
- Several key applications require significantly smoother surfaces, even below 1 Å:
- EUV lithography, high-power laser optics, X-ray mirrors
- Conventional polishing methods (pitch or synthetic pads) can sometimes achieve lower surface roughness
(< 2 Å)
- Requires highly specialized process
- Typically limited to plano surfaces
- Low yields due to unpredictability of process, resulting in high costs
- Our goal was to significantly improve MRF, to deliver a predictable, ultra-low surface roughness polishing process
- Download PDF of "Improve Surface Roughness – Ultra Low Surface Roughness Polishing" case study