Ultra-low Surface Roughness Polishing

• MRF generally maintains or improves surface roughness

• Minimum roughness obtained with MRF typically 3-5 Å
• Results depend on substrate material and MR fluid used

• Several key applications require significantly smoother surfaces, even below 1 Å:

• EUV lithography, high-power laser optics, X-ray mirrors

• Conventional polishing methods (pitch or synthetic pads) can sometimes achieve lower surface roughness
  (< 2 Å)

• Requires highly specialized process
• Typically limited to plano surfaces
• Low yields due to unpredictability of process, resulting in high costs

• Our goal was to significantly improve MRF, to deliver a predictable, ultra-low surface roughness polishing process
• Download PDF of "Improve Surface Roughness – Ultra Low Surface Roughness Polishing" case study