Measurement Process

  • Plano is measured on ASI(Q) using subaperture stitching to get high resolution irregularity measurement
    • This method provides an accurate measurement of irregularity with very high lateral resolution
    • Reference wave error is calculated and subtracted from stitching process

  • Plano is measured on horizontal interferometer to get most accurate measurement of power
    • Three flat test is a known method for acquiring an absolute measurement of power
    • Known power from TF is subtracted

  • Power and irregularity measurements are combined using QED.NET analysis tools to provide ideal hitmap for MRF


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Download a PDF of the the full Case Study, "Polishing Super Flat Flats".