The Q22-750P2 features a 370 mm and a 50 mm diameter wheel, ability to easily switch between wheels, and multi-part polishing.
The latest MRF Technology
- QED.NET software
- EFMS (Electronic Fluid Monitoring System) fluid control system.
Technical capabilities
- Polishing plano optics up to 1000 mm x 750 mm
- Polishing of long radius sphere, asphere and freeform optics
- Multi-part polishing software
Q22-750P2
370 mm Wheel
This video demonstrates polishing a mirror using the 370 mm MRF wheel.
Q22-750P2
370 mm Wheel
This video demonstrates polishing a large mirror using the 370 mm MRF wheel.
Q22-750P2
Dual-wheel platform
The dual-wheel platform provides high flexibility. The 370 mm wheel has high material removal rates to cover large surfaces quickly and the 50 mm wheel can polish small surface features and reduce edge effects.
Q22-750P2
50 mm Wheel
This video demonstrates batch polishing using a 50 mm MRF wheel.
Q22-750P2
370 mm Wheel
This video demonstrates batch polishing using a 370 mm MRF wheel.
Q22-750P2
370 mm Wheel
This video shows a close up of the 370 mm MRF wheel batch polishing.
Q22-750P2
Polish Large Aperture Sizes
Polish aperture sizes up to 1000 mm x 750 mm
Multiple Applications
- Large windows and plano mirrors
- Large phase plate corrections
- Improved surface integrity, e.g., for resistance to laser damage
- Large, light-weighted optics with very thin face sheets
- Large, segmented, long radius telescope optics
Technical Specifications
Workpiece
Moving Range
Long radius capability: 370 mm wheel (see note below)
Long radius capability: 50 mm wheel (see note below)
Note
Long radius capability assumes radius of curvature is > 500 mm (convex or concave). The limitation is best described by maximum slope of part (typically at edge of aperture). Since surface slope is handled differently in the X and Y machine directions, different limits apply depending on how a non-rotationally-symmetric part is oriented on the machine (for a rotationally symmetric design, the smaller, X-direction limit applies).
Positioning Accuracy
Control interfaces
Machine Specifications
Electrical
Specifications are subject to change without notice.
* Please note that workpiece specifications are approximate values to be used as general guidelines. Due to other factors such as workpiece inertia that are difficult to quantify, there are parts outside this range that can indeed be run under certain circumstances, as well as parts within this range that may not run under all circumstances. Please use caution when attempting parts outside these limits, or contact QED for further guidance.
** Vacuum generation is supplied with machine.
*** Distilled water must be used for the chiller. The use of DI water (De-Ionized Water) is prohibited due to its reaction with metals in the lines, couplings and chiller unit.