QED Technologies Q22-750P2

MRF™ Polishing

Q22-750P2

A large-aperture MRF machine, the Q22-750P2 extends MRF figuring capability to large, long radius parts.

The Q22-750P2 features a 370 mm and a 50 mm diameter wheel, ability to easily switch between wheels, and multi-part polishing.

The latest MRF Technology

  • QED.NET software
  • EFMS (Electronic Fluid Monitoring System) fluid control system.

Technical capabilities

  • Polishing plano optics up to 1000 mm x 750 mm
  • Polishing of long radius sphere, asphere and freeform optics
  • Multi-part polishing software

Q22-750P2

370 mm Wheel

This video demonstrates polishing a mirror using the 370 mm MRF wheel.

Q22-750P2

370 mm Wheel

This video demonstrates polishing a large mirror using the 370 mm MRF wheel.

Q22-750P2

Dual-wheel platform

The dual-wheel platform provides high flexibility. The 370 mm wheel has high material removal rates to cover large surfaces quickly and the 50 mm wheel can polish small surface features and reduce edge effects.

QED Technologies MRF Polishing

Q22-750P2

50 mm Wheel

This video demonstrates batch polishing using a 50 mm MRF wheel.

Q22-750P2

370 mm Wheel

This video demonstrates batch polishing using a 370 mm MRF wheel.

Q22-750P2

370 mm Wheel

This video shows a close up of the 370 mm MRF wheel batch polishing.

Q22-750P2

Polish Large Aperture Sizes

Polish aperture sizes up to 1000 mm x 750 mm

QED Technologies MRF Polishing

Multiple Applications

  • Large windows and plano mirrors
  • Large phase plate corrections
  • Improved surface integrity, e.g., for resistance to laser damage
  • Large, light-weighted optics with very thin face sheets
  • Large, segmented, long radius telescope optics

Technical Specifications

Workpiece

Maximum workpiece size (l x w)*
1000 mm x 750 mm
Minimum height of workpiece above table*
127 mm
Workpiece attachment means**
Mechanical (vacuum optional)

Moving Range

(X)
1606 mm
(Y)
812 mm
(Z)
740 mm

Long radius capability: 370 mm wheel (see note below)

Max slope along X-direction
+/- 7 deg
Max slope along Y-direction
+/- 30 deg

Long radius capability: 50 mm wheel (see note below)

Max slope along X-direction
+/- 11 deg
Max slope along Y-direction
+/- 36 deg

Note

Long radius capability assumes radius of curvature is > 500 mm (convex or concave). The limitation is best described by maximum slope of part (typically at edge of aperture). Since surface slope is handled differently in the X and Y machine directions, different limits apply depending on how a non-rotationally-symmetric part is oriented on the machine (for a rotationally symmetric design, the smaller, X-direction limit applies).

Positioning Accuracy

(X, Y, Z)
+/- 0.0076 mm

Control interfaces

CNC Machine control
Siemens 840D sl with Sinamics drives
MRF control
PC equipped with Windows 10 and QED.NET
MRF polishing fluids
Various cerium-oxide and diamond based MR fluids are available depending on the material

Machine Specifications

Machine footprint
3.96 m width x 3.89 m depth
Minimum floor space required
5.49 m width x 5.2 m depth
Machine height installed
3.55 m height
Total machine weight
9,526 kg

Electrical

Electrical
210 VAC, 50/60 Hz, 63A, 3ph+N+PE (5-wire)
Chiller ***
Self-contained chiller included
Compressed air
87 psi (6 bar), 3cfm (85 ℓ/min), dried and filtered to 10 µm (supplied by customer)

Specifications are subject to change without notice.

*  Please note that workpiece specifications are approximate values to be used as general guidelines.  Due to other factors such as workpiece inertia that are difficult to quantify, there are parts outside this range that can indeed be run under certain circumstances, as well as parts within this range that may not run under all circumstances.  Please use caution when attempting parts outside these limits, or contact QED for further guidance.

**    Vacuum generation is supplied with machine.

***  Distilled water must be used for the chiller. The use of DI water (De-Ionized Water) is prohibited due to its reaction with metals in the lines, couplings and chiller unit.

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Learning Center

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